Fast, sensitive, economic, off-line photomask defect review. Our 300 series photomask inspection and review stations use long working-distance microscopy and a unique four-way lighting system to greatly speed up location and identification of micron- and submicron-sized defects
342 PMI Manual
362 PMI DRO/Digital X-Y Position Readout
Our 400 series photomask inspection and review stations have all the features that the 300 series have. The 400 series is designed for examination of reticles up to 9 inches.
442 PMI Manual
PMI DRO/Digital X-Y Position Readout