9" (228.6mm) Photomask Capability

The 442 PMI is a manual system with no data handling (no X-Y co-ordinate system) designed for examination of reticles up to 9 inches for 3COMM seminconductor wafer fab. It is manually operated and with the 50X objective, the 442 can be used for detection of sub-micron defects.

Technical Specifications:

  • Mask reticle sizes: 4 inches (101.6mm) to 9 inches (228.6 mm) with or without pellicle
  • 4 illumination systems combined for 8 illumination modes
  • Standard configuration: 10X eyepieces, 2X, 10X objectives
  • Recommended options: 50X objective and mask paddle
  • Cleanroom Compatible
  • Dimensions: W 20 inches X D 20 inches X H 18 inches

To order this product, call Probing Solutions, Inc., at (775) 246-0999.

Still have questions? Read the frequently asked questions.

Accessories Available: