PSI 442 PMI
9" (228.6mm) Photomask Capability
442 PMI is a manual system with no data handling (no X-Y
co-ordinate system) designed for examination of reticles up to
9 inches for 3COMM seminconductor wafer fab. It is manually operated and with the 50X objective, the 442
can be used for detection of sub-micron defects.
reticle sizes: 4 inches (101.6mm) to 9 inches (228.6 mm) with or
illumination systems combined for 8 illumination modes
configuration: 10X eyepieces, 2X, 10X
options: 50X objective and mask paddle
W 20 inches X D 20 inches X H 18
To order this product, call Probing Solutions, Inc., at (775)
have questions? Read the frequently asked
2004 by Probing Solutions, Inc.
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